TOPCON Proximity Aligner for R&D

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Industrial Instruments

Proximity Aligner for R&D

Compact Proximity Aligner for R&D TME-400R

Desktop Proximity Aligner for R&D TME-150R

TME-400R (sample system for mass production)

TME-400R
(sample system for mass production)

TME-400R (sample system for prototyping)

TME-400R
(sample system for prototyping)

TME-150R

TME-150R

	A compact proximity aligner for R&D allowing high-precision exposure.
	Available in various fields including prototyping up to mass production of LCDs/organic ELs/micromachines/light guides and resist evaluation.
	Supporting not only wafers but also glasses, ceramics and variety of other substrates.
	A variety of options are provided. You can expand your system to an optimal one as you desired.

<Major specifications>
	TME-400R	TME-150R
Exposure method	Proximity
Resolution	Proximity: 7 micronsL&S Soft contact: 3 micronsL&S (Different corresponding to the conditions)	Proximity: 6 micronsL&S Soft contact: 2 micronsL&S Hard contact: 0.5 micronsL&S (Different corresponding to the conditions)
Available substrate size	Max. 300 X 400 mm	50 to 200 mm dia. 40 X 40 to 150 X 150 mm
Available mask size	Max. 340 X 440 mm	250 X 250 mm recommended
Illumination unevenness	5.0% or less
Overlay accuracy	±1.0 microns(with the automatic alignment used)
Gap setting range	0 to 500 microns	0 to 999 microns
Mask setting	Manual
Dimensions of the system main unit	2900(W) X 2300(D) X 1950(H) mm	1200(W) X 1200(D) X 1700(H) mm
Weight of the system main unit	Approx. 4000 kg	Approx. 600 kg
Power supply	3-phase 200 V, 50/60 Hz	3-phase 100 V or 200 V, 50/60 Hz